Our product portfolio of PVD materials includes sources for metal and metal-oxide films for semiconductor, display, LED and photovoltaic devices. At Praxair, we have earned our reputation as a leading supplier through extensive research and development, and dedication to produce the highest quality sputtering targets. Explore our sputtering target product portfolio below.
These targets provide consistent, reproducible process performance with high thickness uniformity and repeatable target-to-target sputtering deposition. The elimination of texture banding during fabrication produces a uniform microstructure, which delivers improved early-life stability and consistent-through-life sputter performance.
Ta 300mm SIP Rs Uniformity Comparison - TaN/Ta Bi Layer Film
With uniform microstructure and controlled texture, our fine grain 6N copper and copper alloy targets offer consistent performance and reliability, with increased target life. The well-controlled fine-grain microstructure enables innovative designs and higher yield strength allows for monobloc target structures, which exhibit minimal deflection and increased target life of up to 50%.
Fine Grain 6N Cu Target Performance for 300mm Endura target
|Property/Characteristics||Praxair's Proprietary Process||Standard Process|
|Grain Size||< 25µm||40-60 µm|
|Yield Strength||180 MPa||92 MPa|
|Tensile Strength||240 MPa||225 MPa|
|Target Life||2100 kWh||1300*kWh|
Designed to improve the cost of ownership for aluminum deposition on 200mm wafers, the RE-Al â PLUS target demonstrates excellent performance throughout its rated lifetime of 1600 kWh (equivalent to 9,500 1-µm films).
When used with electrostatic chuck shield kits, the RE-Al â PLUS target can significantly increase the interval between kit and target replacements, allowing for increased tool utilization. In addition to the RE-Al â PLUS target, the RE-Al Supreme target is available with the same benefits for 150mm wafer processing.
Alumina Doped Zinc Oxide (AZO) targets provide highly-effective transparent conducting oxide (TCO) layers for amorphous silicon and other thin-film photovoltaic devices. Targets are available in a tubular configuration to maximize material usage, yield and production time.